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OEQELAB, Seoul National University

NCRCAPAS, Seoul National University

세미나 안내

박남규 2004.11.04 20:22 조회 수 : 3520 추천:88

세미나 안내 11월5일(금) 오후 4시 920호



제 목 : Towards CMOS Compatible Plasmonics and Nanophotonics

강 사 : Mark Brongersma

소 속 : Associate Professor in Dpt. of Materials Science and Engineering at Stanford Univ.



강사이력 :

Mark Brongersma is an Assistant Professor in the Department of Materials Science and Engineering at Stanford University. His research is directed towards the development and physical analysis of new materials and structures that find use in nanoscale electronic and photonic devices. His most recent work is focused on Si nanocrystal-based memory structures, optical micro-resonators, and metallic nanostructures that mold the flow of light below the diffraction limit. Dr. Brongersma received his PhD in Materials Science from the FOM Institute in Amsterdam, The Netherlands, in 1998. From 1998-2001 he was a postdoctoral research fellow at the California Institute of Technology.



시 간 : 2004년 11월 5일 금요일 오후 4시

장 소 : 신공학관 301동 920호



Abstract

The enormous growth of the communication industry has increased the demand for new photonic functionality at a low cost. For this purpose, it would be highly desirable to have light sources, waveguides, amplifiers, and detectors that are monolithically fabricated on Si with CMOS technology. The materials used in current CMOS integrated circuit technologies are chosen to optimize electronic performance. However, upon closer examination these materials are also suitable for producing, manipulating, and detecting optical signals. The unique properties of Si nanostructures such as nanoparticles and nanowires can be exploited to fabricate Si-based light sources and detectors. SiO2 can be used to fabricate highly transparent optical waveguides and high Q micro-disc resonators. Metallic interconnects can serve as plasmonic waveguides that guide electromagnetic waves at optical frequency (“light”) below the diffraction limit.

To evaluate the use of deep submicron CMOS technology as a fabrication platform for integrated nanophotonic and plasmonic devices, our group is developing a laboratory-on-a-chip environment. On this platform we are fabricating and testing light emitting Si nanostructures, CMOS image sensors utilizing subwavelength metallic nanostructures, and plasmonic devices. Optical techniques, including scanning near-field optical microscopy are used to investigate the unique properties of these devices and study the fundamentals of light-matter interactions at the nanoscale.



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